DAEJEON < invest Korea

South Korean researchers have developed a new semiconductor patterning technology that uses a camera flash instead of standard photolithography.

The research team at the Department of Materials Science and Engineering of Korea Advanced Institute of Science & Technology (KAIST) said on Tuesday they found a new method to create a 7 nanometer conductive pattern on a substrate by exposing it to a short burst of a camera flashlight, which takes about one-thousandth of a second.

The process used to transfer a pattern to a layer on the microchip is called lithography, but standard photolithography is limited in microfabrication with less than 10 nanometers in size.

Micropatterning is required to make high-capacity and high-performance semiconductor devices.

The new technology is expected to be applied to develop microchips dedicated to artificial intelligence and the Internet of Things (IoT), according to the research team.


[Source: KAIST]

By Kim Yoon-jin

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Source: Pulse by Maeil Business News Korea (Sep. 14, 2017)